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SiC單晶生長

發(fā)布時間:2008/6/5 0:00:00 訪問次數(shù):992

sic單晶生長

growth of bulk sic

劉喆  徐現(xiàn)剛 

摘 要:本文綜述了國際上sic單晶生長的發(fā)展歷史及現(xiàn)狀.從其結構特點生長方法的選擇,生長過程中的問題以及存在的晶體缺陷等方面進行了介紹.
關鍵詞:碳化硅;單晶生長;寬禁帶半導體
分類號:o782.7 文獻標識碼:a
文章編號:1004-793x(2003)02-0274-05

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    基金項目:國家杰出青年科學基金資助項日(60025409)和863資助項日(2001aa31108).
    作者簡介:劉喆(1978-),女,碩士研究生,從事sic晶體生長的研究.
    作者單位:劉喆(山東大學晶體材料國家重點實驗室,山東,濟南,250100) 
         徐現(xiàn)剛(山東大學晶體材料國家重點實驗室,山東,濟南,250100) 

    參考文獻:

    [1]w.f. knippenberg, growth phenomena in silicon carbide. philips research reports, 1963,18:16~274.
    [2]j.a. lely,ber. dent. keram..ges,1955,28:229.
    [3]yu. m. tairov, v. f. tsvetkov. investigation of growth processes of ingots of silicon carbide single crystals . journal of crystal growth, 1978,43:209~212.
    [4]yu. m. tairov, v. f. tsvetkov. general principles of growing largesize single crystals of various silicon carbide polytypes. . journal of crystal growth, 1981,52: 146~150.
    [5]dieter h. hofman, matthias h. muller. prospects of the use liquid phase techniques for the growth of bulk silicon carbide crystals. .mater. sci. and eng. b, 1999,61~62: 29~39.
    [6]g. ziegler, p. lanig, dietmar theis, claus weyrich. single crystal growth of sic substrate material for blue light emitting diodes. .ieee trans. electron. devices ed, 1983,30(4): 277.
    [7]m. muller, m. bickermann, d. hofmann, a. d . weber, a. winnack-er. studies on sic liquid phase crystallization as technique for sicbulk growth. mater. sci. forum, 1998,264~268:69~72.
    [8]r. yakimova, e. janzen. current states and advances in the growth of sic . diamond and related materials, 2000,9: 432~438.
    [9]g. augustine, h. mcd. hobgood, v. balakrishna, g. dunne, r. h.hopkins. physical vapor transport growth and properties of sic monocrystals of 4h polytype. phys. stat. sol. (b), 1997,202:137~148.
    [10]d. schulz, g. wagner, j. dolle, k. irmscher, t. muller , h. j. rost,d. siche, j. wollweber. impurity incorporation during sublimationgrowth of 6h bulk sic. . journal of crystal grwoth, 1999, 198/199:1024~1027.
    [11]yu. m. tairov. growth of bulk sic . mater. sci. and eng. b.,1999,61~62:83~89.
    [12]r. yakimova, m. syvajarvi, m. tuominen, t. iakimov, p. raback, a.vehanen, e. janze-n. seed sublimation growth of 6h and 4h-sic crystals . mater. sci. and eng. b, 1999,61-62: 54-57.
    [13]m.s. ramm, e. n. mokhov, et al. optimization of sublimation growth of sic bulk crystals using modeling . mater. sci. and eng. b.,1999,61~62: 107~112.
    [14]i.a. zhmakin, a. v. kulik, yu, karpov, s. e. demina, m. s. ramm,yu. n. makarov. evolution of thermoelastic strain and dislocation density during sublimation growth of silicon carbide . diamond and related mater. 2000,9: 446~451.
    [15]d. schulz, g. wagned et al. influence of excess silicon on the surface morphology and defect structure during the initial stages of sic sublimation grwoth. mater. sci. and eng. b, 1999,61~62: 86~88.
    [16]yu. a. vodakov, a. d. roenk

    sic單晶生長

    growth of bulk sic

    劉喆  徐現(xiàn)剛 

    摘 要:本文綜述了國際上sic單晶生長的發(fā)展歷史及現(xiàn)狀.從其結構特點生長方法的選擇,生長過程中的問題以及存在的晶體缺陷等方面進行了介紹.
    關鍵詞:碳化硅;單晶生長;寬禁帶半導體
    分類號:o782.7 文獻標識碼:a
    文章編號:1004-793x(2003)02-0274-05

    基金項目:國家杰出青年科學基金資助項日(60025409)和863資助項日(2001aa31108).
    作者簡介:劉喆(1978-),女,碩士研究生,從事sic晶體生長的研究.
    作者單位:劉喆(山東大學晶體材料國家重點實驗室,山東,濟南,250100) 
         徐現(xiàn)剛(山東大學晶體材料國家重點實驗室,山東,濟南,250100) 

    參考文獻:

    [1]w.f. knippenberg, growth phenomena in silicon carbide. philips research reports, 1963,18:16~274.
    [2]j.a. lely,ber. dent. keram..ges,1955,28:229.
    [3]yu. m. tairov, v. f. tsvetkov. investigation of growth processes of ingots of silicon carbide single crystals . journal of crystal growth, 1978,43:209~212.
    [4]yu. m. tairov, v. f. tsvetkov. general principles of growing largesize single crystals of various silicon carbide polytypes. . journal of crystal growth, 1981,52: 146~150.
    [5]dieter h. hofman, matthias h. muller. prospects of the use liquid phase techniques for the growth of bulk silicon carbide crystals. .mater. sci. and eng. b, 1999,61~62: 29~39.
    [6]g. ziegler, p. lanig, dietmar theis, claus weyrich. single crystal growth of sic substrate material for blue light emitting diodes. .ieee trans. electron. devices ed, 1983,30(4): 277.
    [7]m. muller, m. bickermann, d. hofmann, a. d . weber, a. winnack-er. studies on sic liquid phase crystallization as technique for sicbulk growth. mater. sci. forum, 1998,264~268:69~72.
    [8]r. yakimova, e. janzen. current states and advances in the growth of sic . diamond and related materials, 2000,9: 432~438.
    [9]g. augustine, h. mcd. hobgood, v. balakrishna, g. dunne, r. h.hopkins. physical vapor transport growth and properties of sic monocrystals of 4h polytype. phys. stat. sol. (b), 1997,202:137~148.
    [10]d. schulz, g. wagner, j. dolle, k. irmscher, t. muller , h. j. rost,d. siche, j. wollweber. impurity incorporation during sublimationgrowth of 6h bulk sic. . journal of crystal grwoth, 1999, 198/199:1024~1027.
    [11]yu. m. tairov. growth of bulk sic . mater. sci. and eng. b.,1999,61~62:83~89.
    [12]r. yakimova, m. syvajarvi, m. tuominen, t. iakimov, p. raback, a.vehanen, e. janze-n. seed sublimation growth of 6h and 4h-sic crystals . mater. sci. and eng. b, 1999,61-62: 54-57.
    [13]m.s. ramm, e. n. mokhov, et al. optimization of sublimation growth of sic bulk crystals using modeling . mater. sci. and eng. b.,1999,61~62: 107~112.
    [14]i.a. zhmakin, a. v. kulik, yu, karpov, s. e. demina, m. s. ramm,yu. n. makarov. evolution of thermoelastic strain and dislocation density during sublimation growth of silicon carbide . diamond and related mater. 2000,9: 446~451.
    [15]d. schulz, g. wagned et al. influence of excess silicon on the surface morphology and defect structure during the initial stages of sic sublimation grwoth. mater. sci. and eng. b, 1999,61~62: 86~88.
    [16]yu. a. vodakov, a. d. roenk

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